QuantumCore’s wafer-by-wafer nanofabrication tracker

Field notes

The tracker represents fabrication as a branching route rather than a simple checklist, separating wafer-level work from later block-level operations. It exposes named tools such as Plassys, Heidelberg MLA, JEOL EBL, DISCO, and G2N, while attaching identifiers to specific wafers and blocks. The visible RCA-1 procedure includes a 5:1:1 solution ratio, a 75–80 °C bath, a 10-minute soak, and three DI rinse trays. Several downstream procedures remain marked SOP pending.