Observed arrival · 2026-09-24

Desktop Maskless Lithography, Built by One Engineer

iliasidorov.com Visit website

Editorial interest 85/100 Selection signal · not a rating of the site

Ilia Sidorov documents a working desktop machine that exposes wafer patterns directly from GDSII layout files, without photomasks.

Landing page captured for the 2026-09-24 issue.

For: Lithography engineers and precision-motion builders
Worth noticing: Prototype 1.0 uses a 1920 × 1080 DMD and 440 nm LED, with calibration applied before each exposure field.

Field notes

The page describes the first machine as a light-tight desktop enclosure with a DMD projection head, servo-driven XY stage, optical scales, and an emergency stop. Its calibration account is unusually concrete: a camera in the wafer plane measures geometry and illumination, and the software reportedly refuses exposure with an uncalibrated objective. The successor is still in design, using three similar linear modules on a standard M6 optical-breadboard grid.

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Editorial observations of this landing page, not a rating.

○OpenPublic substance visible

✦PrettyNotable craft visible

●ProPolished or operationally mature

◎NicheUnusually specific use

◉HumanPersonal, local, civic, or handmade

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